Abstract

Monte-Carlo simulation (MCS) using X-ray emission due to electron beam excitation is applied to determine the film thickness of a one-layer/substrate system. So far, the characteristic X-ray intensity has been used in this kind of simulation. However, it is difficult to utilize this method for a complicated system such as a multilayered structure. We succeeded in determining the layer thicknesses for a two-layered system, by a new method using characteristic Si-L2,3 soft X-ray emission band spectra. This method is shown to be promising for the quantitative analysis of multilayer and complicated systems. In this study, a quantitative analysis using both MCS and Si-L2,3 emission band spectra is demonstrated for the NiSi/NiSi2/Si system.

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