Abstract

MeV heavy ion microprobes, 3 MeV C 2+, Si 2+ and Ni 2+ were applied for micro-PIXE measurements for aluminium, silicon, copper, silver and gold substrates. To compare with the case of light ions, a 2 MeV H + microbeam was also employed. It was found that the X-ray yields vary drastically as a function of the combination of the atomic number of incident ions and target atoms. This indicates that there is an optimum combination for specific element analysis. The minimum detectable gold weights in silicon were also estimated for a practical case and it was found that a carbon beam was best for measuring gold atoms in silicon.

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