Abstract

In this article, the authors attempt to describe the core quality inspection during semiconductor manufacturing in terms of production efficiency and yield. Special focus is therefore given to photolithography, which is the most critical step for the fabrication of wafer patterns in front-end processes. Further, machine learning approaches are demonstrated and their applicability in semiconductor manufacturing industry is discussed. Also, a technical concept regarding virtual metrology for advanced process control in semiconductor production is introduced as a potential utilization case. Finally, current status and future trends in technology as well as application are summarized based on authors' perspective in the concluding section.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.