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https://doi.org/10.1145/3424311.3424326
Copy DOIPublication Date: Jan 14, 2020 |
Citations: 5 |
In this article, the authors attempt to describe the core quality inspection during semiconductor manufacturing in terms of production efficiency and yield. Special focus is therefore given to photolithography, which is the most critical step for the fabrication of wafer patterns in front-end processes. Further, machine learning approaches are demonstrated and their applicability in semiconductor manufacturing industry is discussed. Also, a technical concept regarding virtual metrology for advanced process control in semiconductor production is introduced as a potential utilization case. Finally, current status and future trends in technology as well as application are summarized based on authors' perspective in the concluding section.
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