Abstract
Hydrogen ions are not widely used in low or medium-energy ion scattering spectroscopy. However, in certain cases, the use of non-destructive hydrogen ions with low nuclear stopping may provide additional information compared with noble gas ions. In this work, we describe in situ analysis of nanometer layer deposition of Au on Si and vice versa using keV-energy proton scattering spectroscopy. Ion beam sputtering and thermal evaporation were used for deposition of surface layers. The maximum thickness of deposited layers was measured with X-ray photoelectron spectroscopy and surface profiler. The accuracy of in situ surface layer thickness determination with energy spectra of scattered protons is discussed.
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