Application of ion beam techniques in superconducting electronics

Abstract

In superconducting electronics ion beams are used traditionally in deposition of thin films by magnetron sputtering and in patterning films by dry ion etching. By means of ion implantation one can fabricate also weak links (Josephson junction) from high- T c materials. If multiple ion implantation with different energy and doses is used, it is possible to improve ion implanted high critical temperature weak links either by creating a homogeneous profile or by forming a conducting channel inside the film. In this paper we present investigation of the properties of oxygen ion modified YBCO films intended to be used as barriers in HT c Josephson junctions by optical methods and Rutherford backscattering spectroscopy and channelling.