Application of honeycomb pattern to Ti2AlN MAX phase films by plasma etching

Abstract

The honeycomb pattern possesses a distinctive hexagonal structure capable of seamless repetition on a flat surface, leaving no gaps. Moreover, all arm thicknesses and angles are equal to one another. This remarkable configuration is deemed biomimetic, with numerous examples found in nature. Notably, it exhibits remarkably low density and exceptional mechanical strength. MAX phase films have gathered significant attention due to their exceptional capacity to amalgamate the essential properties of both metals and ceramics. Additionally, they possess the unique ability to effectively mend surface cracks that may arise as a result of friction-wear, restoring the material to a certain degree of integrity. In this study, Ti2AlN MAX phase thin films were deposited on M2 steel substrates by a closed field unbalanced magnetron sputtering system (CFUBMS). 750 °C heat treatment was applied to obtain the produced films in crystalline form. In addition, plasma etching parameters suitable for the phase structure of the deposited film were determined. With the inductive coupling plasma etching (ICP) process, the honeycomb pattern was given to the Ti2AlN MAX phase films with a continuous and smooth geometry at a depth of 2 μm. This study gives ideas for the development of multi-coating systems in which patterns of different geometries are included in a single layer.