Abstract
A discussion is given of the use of X-ray diffraction in the structural characterization of surfaces and thin films with an arbitrary orientation with respect to the diffracted rays. The instrumental effects arising in a general diffraction geometry are considered in detail with reference to a Bragg-Brentano diffractometer. In particular, intensity variations, peak shifts and broadening are analysed as functions of the scattering angle and the surface orientation. These effects generally obscure the intrinsic structural properties so that an appropriate correction is required in an exhaustive X-ray investigation. Applications are discussed and examples are given in the study of the anisotropic structural properties of PbTe thin films prepared by sputtering onto various substrates.
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