Apparatus for codeposition and layered deposition of reactive metals and volatile organic compounds with control of stoichiometry and film thickness

Abstract

An effective method is reported for the simultaneous or sequential physical vapor deposition of reactive alkali metals and volatile macrocyclic complexants which react to form thin stoichiometric films of alkalides and electrides. These thermally unstable and highly reactive films, typically between 300 and 1500 Å thick, are deposited under high vacuum onto a quartz substrate which can be cooled to as low as −130 °C. Quantitative optical absorption measurements are made on these films in situ. Acquisition of the optical data and control of sample deposition rates, oven temperatures, and film thicknesses are accomplished with a computer.