Abstract
In this paper, pulsed metal vacuum arc deposition technology was employed to fabricate SiO x film on Ti-6Al-4V substrates with the oxygen partial pressure at 0.2∼0.5x10 -2 Pa. X-ray photoelectron spectroscopy and atomic force microscopy were used to characterize the as-deposited SiO x film. Simulated body fluid (SBF) immersion tests were performed for the in vitro bioactivity evaluation of the as-deposite film. The results obtained from the scanning electron microscopy, X-ray diffraction and Fourier transform infrared demonstrated the formation of apatite on the SiO x film after incubation in SBF solution. The bioactivity maybe related to the plenty of oxygen vacancies in the film, which are active and hydrolyze in the solution to form Si-OH groups. It is necessary to induce the formation of apatite.
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