Abstract

An antireflective structure with two-dimensional 300-nm periodicity was fabricated on a phosphate glass surface using an imprinting process with a SiC mold. The optimized structure designed using RCWA calculation was a convex circular cone sharing the ridge line of adjacent cones. The SiC mold was fabricated using electron beam drawing and subsequent reactive ion etching with CHF 3 and O 2 gases. The glass’ surface reflectance was estimated as 0.2% at 530 nm wavelength, which was approximately 1/20 that of the optically polished surface.

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