Abstract
An approach for fabricating sub-wavelength antireflective structures on SiC material is demonstrated. A time-efficient scalable nanopatterning method by rapid thermal annealing of thin metal film is applied followed by a dry etching process. Size-dependent optical properties of the antireflective SiC structures have been investigated. It is found that the surface reflection of SiC in the visible spectral range is significantly suppressed by applying the antireflective structures. Meanwhile, optical transmission and absorption could be tuned by modifying the feature size of the structure. It is believed that this effective fabrication method of antireflective structures could also be realized on other semiconductor materials or devices.
Highlights
Over the past decades, technology for energy-efficient devices such as solar cells and light-emitting diodes (LEDs) has developed rapidly due to the upcoming energy shortage [1,2]
Due to the large refractive index discontinuity at the air–semiconductor material interface, solar cell devices have a large surface reflection [1,3] and LEDs usually suffer from low light extraction efficiency because of the total internal reflection [2,4]
A broadband antireflection or light extraction improvement can be achieved by applying a stack of antireflection coatings with an appropriate design [5,6]
Summary
Technology for energy-efficient devices such as solar cells and light-emitting diodes (LEDs) has developed rapidly due to the upcoming energy shortage [1,2]. Due to the large refractive index discontinuity at the air–semiconductor material interface, solar cell devices have a large surface reflection [1,3] and LEDs usually suffer from low light extraction efficiency because of the total internal reflection [2,4]. Using sub-wavelength nanostructures has been extensively reported as an effective way to reduce the surface reflection on solar cells [1,3,7] or to enhance the light extraction on LEDs [2,4,8].
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