Abstract
ZnO thin films as an antireflective (AR) coating have been successfully fabricated on spherical Si solar cells by chemical deposition, which enables uniform film formation. ZnO films were prepared chemically by immersing the cell in an aqueous solution of zinc nitrate and dimethylamineborane maintained at 80 °C. The current–voltage measurements of the solar cells confirmed the increase in short circuit current induced by the AR effect. The open circuit voltage and fill factor were improved by surface passivation. As a result, the conversion efficiency of cells without an AR coating (9.45%) increased to 11.8%, which represents a 25% (relative) increase. The results indicate that the chemical deposition of ZnO is effective for the AR coating of spherical Si solar cells.
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