Abstract
Single- and double-layer thin-film antireflection coatings have been computer designed for ZnIn2S4 single crystals. The parameters of the thin-film layers, i.e., optimal thickness and refractive index, were determined. SiOx thin films, as antireflection coatings, have been deposited by reactive sputtering in order to reduce the average reflectance and to increase the photocurrent of the ZnIn2S4 single crystal.
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