Abstract
The use of thin-film deposition in the fabrication of antireflection-coated diffractive optical elements is discussed. The antireflection coatings for these diffractive elements are optimized on the basis of an angular spectrum approach and the method of characteristic matrices. A minimum reflectivity as low as 1 x 10<sup>-4</sup> is realized using <i>in situ</i> controlled multilayers of TiO<sub>2</sub> and SiO<sub>2</sub>. The blazed profile of the diftractive optical elements is approximated by a stepped profile with up to 32 phase levels. The highest measured diffraction efficiency for 32-level Fresnel zone lenses was 97%.
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