Abstract
Nd3+:Y2O3 nanograins-like structure films with various Nd concentrations, were deposited on Si (100) substrates by aerosol assisted chemical vapor deposition (AACVD) process. The intense 900nm emission of Nd3+ corresponding to the 4F3/2→4I9/2 transition was investigated as a function of the annealing temperature. The reflectance percentage of the optimized 5mol.% Nd:Y2O3 film was recorded at about 16% in 400–1000nm range. The refractive index (n=1.94) and the low porosity (P=2.74%) showed the high transparency of this film. The obtained results demonstrate that this film can enhance the Si solar cell efficiency by light trapping and spectrum shifting.
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