Abstract

In2O3is important because it has been widely used as a transparent contact material and an active gas sensor material. To understand and utilize its intrinsic physics as a semiconductor, it is necessary to have In2O3with a high material quality. In this article, single-crystalline (001)-oriented In2O3thin films were grown on yttria-stabilized zirconia (001) substrate, and a group theory analysis and transmission electron microscopy (TEM) experiments were conducted to investigate the defects within the In2O3film. Owing to the reduced symmetry of the bixbyite structure (space group Ia{\overline 3}) in comparison with the fluorite template (space group Fm {\overline 3}m), the formation of antiphase domains and 90° rotation domains in the In2O3thin films is anticipated. This prediction is confirmed experimentally by TEM and high-angle annular dark-field scanning transmission electron microscopy images. The size of the enclosed domains ranges from 50 to 300 nm, and the major domain boundaries are along the (110), (1{\overline 1}0), (010) and (100) planes. The rotation domains are related by a fourfold rotation operation along the 〈001〉 directions, which will cause the permutation of the axes of the bixbyite structure.

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