Abstract
Broadband dielectric relaxation measurements of tris(dimethylsiloxy)phenylsilane were made at ambient pressure and at elevated pressures. The data show an anomalous behavior not previously seen in any other glass-formers; namely, the structural alpha-relaxation loss peak narrows with increasing pressure and temperature at constant peak frequency. Interpreted by the coupling model, the effect is due to reduction of intermolecular coupling at elevated pressures. This interpretation has support from the observed decrease of the separation between the alpha-relaxation and the Johari-Goldstein secondary relaxation, as well as the smaller steepness or "fragility" index m of the data obtained at 1.7 GPa than at ambient pressure.
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