Abstract
Cyclic voltammetry was used in order to directly deposit hydrous ruthenium oxide on conductive diamond substrates. It was found that, at the hydrogen-terminated boron-doped diamond (BDD) surface, the overall deposition process is rather slow compared to the case of metal substrates. Nevertheless, the values estimated for the specific charge and specific capacitance by cyclic voltammetric and chronopotentiometric experiments, respectively, compare favorably to those reported in the literature. Additional advantages of using a BDD support are the excellent stability of the response, the extreme robustness even under severe functioning conditions, and, importantly, negligible substrate effects. It was also observed that deposition at a BDD powder surface greatly enhanced both the specific charge and the specific capacitance. These features strongly recommend the use of conductive diamond powder as a substrate for hydrous ruthenium oxide, particularly in view of possible electrochemical capacitor applications.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.