Abstract

The electrochemical corrosion behaviour of Cu, Co and Ni silicides was studied using potentiostatic quasi-steady-state techniques. Sulphate and chloride electrolytes were employed. In separate experiments, the fraction of total current i tota1 , causing oxygen evolution, i 0 2 , and corrosion, i corr was determined. The effect of annealing did not appear to give rise to major changes of behaviour. Details of metallographic structures both before and after corrosion are given. The importance of structure in its effect on the corrosion rate is considered.

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