Abstract
The anodic behavior of copper has been studied up to about 1.5 v above the floating potential, mainly in 50% orthophosphoric acid. The floating potential is at about −0.16 v (with respect to 0.1N calomel). Characteristic potentials occur at and . Electropolishing is found between these two potentials and above 0.8 v. The limiting current appears to be governed by the convection of the reaction products away from the electrode, and there seem to be at least two low‐resistance layers which can form on the surface, one associated with and the other with . Below , the cation is primarily Cu+, above it is primarily Cu++.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
