Abstract
We present a new processing scheme for the deposition of microporous, sol–gel derived silica membranes on inexpensive, commercially available anodic alumina (Anodisk™) supports. In a first step, a surfactant-templated mesoporous silica sublayer (pore size 2–6 nm) is deposited on the Anodisk support by dip-coating, in order to provide a smooth transition from the pore size of the support (20 or 100 nm) to that of the membrane (3–4 Å). Subsequently, the microporous gas separation membrane layer is deposited by spin-coating, resulting in a defect-free dual-layer micro-/mesoporous silica membrane exhibiting high permeance and high selectivity for size selective gas separations. For example, in the case of CO 2:N 2 separation, the CO 2 permeance reached 3.0 MPU (1 MPU = 10 −7 mol m −2 s −1 Pa −1) coupled with a CO 2:N 2 separation factor in excess of 80 at 25 °C. This processing scheme can be utilized for laboratory-scale development of other types of microporous or dense inorganic membranes, taking advantage of the availability, low cost and low permeation resistance of anodic alumina (or other metal oxide) meso- and macroporous supports.
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