Abstract
Annealing of CH3I films formed on TiO2(110) at 90K has been investigated using thermal desorption and photodesorption. At a surface temperature of 90K, the multilayer film of CH3I grows stochastically. Thermal desorption and photodesorption studies indicate that annealing a CH3I film at temperatures of 120–125K for less than ∼12min induces the desorption of weakly bound molecules and produces two CH3I phases on TiO2(110): a two-dimensional (2D) monolayer phase and a three-dimensional (3D) multilayer phase. After annealing at ∼125K for 12min, the 3D multilayer phase is completely desorbed and only the 2D monolayer phase is left on the TiO2(110) surface. This 2D layer has a saturation molecular density greater than that of the 1ML film deposited at 90K. When the annealing temperature is increased to above 130K, the thermal stability of the 2D film increases and the number of the CH3I molecules left on the TiO2(110) surface decreases.
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