Abstract
Co/Pt multilayer films sputter-deposited with and without a substrate bias of V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">B</sub> =-30 V were annealed in vacuum at 300 and 400°C. On annealing the saturation magnetization M <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">s</sub> and the saturation Kerr rotation angle θ <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">K</sub> both increased, while the perpendicular anisotropy energy K <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">u</sub> decreased monotonically. The decrease in K <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">u</sub> was larger for -30 V biased films than for 0 V films because of the larger decrease in the surface anisotropy K <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">s</sub> for -30 V biased films. This larger decrease in K <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">s</sub> is discussed taking the relaxation of lattice strain due to annealing into account.
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