Abstract
The diffusion coefficients of nitrogen in N-implanted polycrystalline Ni have been deduced. Both bulk and Ni-evaporated samples implanted with nitrogen were annealed at 150–500° C. The nitrogen profiles were probed using the nuclear resonance broadening technique. The value of 0.99±0.12 eV for the activation energy and (3.0 −2.8 +40 )×10−6 cm2/s for the frequency factor were obtained for implanted N in bulk Ni. The solubilities for both the bulk and evaporated Ni samples are given. In evaporated Ni nitrogen migration is enhanced due to the defects arising during evaporation.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Paper version not known
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
