Abstract
We report on thermal conductivity of W films 350 nm thick sputter-deposited by glancing angle deposition (GLAD). The 3ω method is used to measure the in-plane thermal conductivity kx and ky for films deposited with a deposition angle α of 0° and 80°. For classical films (α=0°), the thermal conductivity is 71 Wm−1K−1, whereas for GLAD films (α=80°) the in-plane conduction drops to kx=3.2 Wm−1K−1 and ky=4.8 Wm−1K−1. The in-plane thermal conductivity anisotropy corresponds to a heat conduction favored in the direction perpendicular to the deposition axis, which is related to the anisotropic columnar microstructure. Electrical conductivity is also determined leading to a significant deviation from the Wiedemann-Franz law for the GLAD films.
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