Analytical Modeling of Potential Barrier for Charge Transfer in Pinned Photodiode CMOS Image Sensors

Abstract

A potential barrier is one of the most common lag sources for charge transfer in pinned photodiode (PPD) CMOS image sensors (CISs). In this article, an analytical model of the potential barrier is proposed for the PPD combined with the transfer gate (TG). Through detailed electrostatic analysis of the PPD and TG, the potential barrier is analytically expressed as a function of the doping concentrations, TG voltage, spatial dimensions, and other physical parameters. The proposed model is validated by technology computer-aided design (TCAD) simulations, and the results show that the model data are in good agreement with the TCAD simulations in terms of the magnitude and location of the potential barrier. The model can be used for the design, simulation, and optimization of PPD-based pixels in CISs to improve the charge transfer efficiency (CTE) and reduce the image lag noise.