Analytical electron microscopy of Si1−xGex/Si heterostructures and local isolation structures

Abstract

AbstractThe convergent beam electron diffraction (CBED) technique has been applied to determine the lattice strain in Si1−xGex/Si heterostructures and in local isolation structures. Both plan and cross-sections have been investigated by transmission electron microscopy. In the heterostructures, the strain value obtained by CBED along the growth direction ɛCRED is affected by a relaxation induced by the thinning process in a direction normal to the cross-section plane, being generally smaller than the bulk tetragonal value ɛT This effect can be overcome using the large angle CBED technique on plan sections. In addition, in the heterostructures the Ge concentration has been determined by energy dispersive X-ray spectrometry, allowing the pseudomorphicity of the samples to be evaluated. All the values of strain and Ge concentration thus obtained are in good agreement with those deduced from Rutherford backscattering spectrometry. In isolation structures, the CBED technique has been applied to determine the d...