Analytical Determination of Collisional Sheath Properties for Triple Frequency Capacitively Coupled Plasma

Abstract

A self-consistent analytical model for a time-independent collisional capacitively coupled plasma (CCP) sheath driven by a triple frequency (TF) RF current source is proposed. Sheath parameters are calculated using this model for some standard plasma parameters and are compared with those of a single frequency (SF) and a dual frequency (DF) capacitively coupled collisional sheath. This model estimates higher values of sheath width and potential with more oscillating behavior compared with SF and DF sheaths. By proper choice of source frequencies or phase differences in the source currents, it is possible to adjust the ion energy hitting the electrode. Use of TF source is found to facilitate better control upon sheath parameters for collisional CCP.