Abstract

Abstract Metal coatings of Ti are vapor-deposited (200 A/day) in MACROTOR and MICROTOR during low temperature H2-discharge cleaning and operated far away from the gettering threshold for plasma impurity control. Several methods of analysis (X-ray diffraction, ESCA, AES, SEM) show that after several months of deposition two major effects have an impact on the coating: (a) formation of a porous microstructure which enhances H2,-gas trapping: (b) formation of Ti-hydride of a 100 A crystallite size and with large microstrain present. Both effects are responsible for a mechanically and chemically unstable first wall. H/D-exchange and H-retention are affected most by the existing wall condition. These difficulties may be avoided by using a hot (≈400°C) liner.

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