Abstract
After storage of silicon wafers in polymer boxes, an increase in the number of localized light scatters (LLS) may be observed. This phenomenon, caused by chemical processes on the surface, is called time dependent haze (TDH). Intentionally generated TDH was investigated. An increase of LLS could be observed after the storage of contaminated wafers. Preparations with inorganic compounds exhibit crystallites formed on the surface. A high vapor pressure and a good solubility in water of organic compounds favored the generation of organic TDH. In both experiments, copper promoted the formation of TDH. Preparations with mixtures of contaminants revealed the interaction of chemical compounds on the surface. Ammonium sulfate had a strong impact on the formation of TDH. Pulsed force mode-atomic-force microscopy measurements, a new mode in atomic force microscopy, was used to differentiate chemical species constituting TDH by adhesion force mapping. © 2003 The Electrochemical Society. All rights reserved.
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