Analysis of Thin Films and Multi-Layer Thin Films containing Light Elements by XRF

Abstract

Analysis of multi-layer thin films by XRF, using the fundamental parameter method, is a common and accurate method to determine thicknesses and chemical structure, as long as the films contain no hght elements. As an attempt to further extend the method, we present experimental results from single layer films made of carbon and silicon nitride with thicknesses ranging from 100 Å to 1000 Å, from single layer films of cobalt and oxygen matrices with varying oxygen concentration, and from complex multi-layer structures made of a combination of palladium, copper and carbon. The experimental data show a significant deviation from the results computed by the standard fundamental parameter method.