Abstract
Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS/ESCA) have been used to characterize a variety of samples. The relatively high spatial resolution of AES is very useful for the surface compositional analysis of semiconductor devices and can often provide information about surface chemistry, as well. Where spatial resolution limitations are not a problem, XPS usually provides superior quantitative analysis, as well as superior chemical information on the surface composition. Examples are taken from studies of (a) the nanowear of ZnO [AES], (b) the annealing of Al/Ti films on SiC [AES, depth profiling], (c) the characterization of plasma-polymerized photonic films [XPS] and (d) peak selection in quantitative analysis [XPS].
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