Abstract
The behavior of random telegraph signal (RTS) noise in metal oxide semiconductor field effect transistor (MOSFETs) with different oxidation processes and its effects on the readout circuit in complementary MOS (CMOS) image sensor were experimentally studied. Statistically, RTS noise in large number of devices have been measured both in the device with single oxide and dual oxide and we analyzed its amplitude and power spectrum density. Through the analysis, we found that there are significantly different behaviors of RTS noise between single oxide devices and dual oxide devices due to different characteristic of oxide traps. We not only provided information of traps in both single and dual oxide devices but also applied different RTS noise behavior of both two cases to readout circuits in CMOS image sensor.
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