Abstract
Various chemical species were implanted at the interface between evaporated iron films and their sapphire substrates. From interfacial free energy considerations, it was postulated that implantation of Cr ions should increase the strength of the bond between iron. and sapphire, whereas implantation of Ni ions should weaken the bonds. Implantation of Fe ions should cause changes due to irradiation-produced defects but exhibit no chemical effect. The pull test was used to evaluate the bond strength of unimplanted and implanted specimens. Since there was large scatter in the data, it was necessary to conduct a statistical analysis. It was assumed that the separation of the film from the substrate was nucleated by interfacial defects in the bond. Because the Weibull analysis was developed to describe the failure probability due to a population of flaw-induced cracks. this technique was used to interpret the data.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
