Abstract
The sensitivity to material parameters of surface plasmon oscillations is explored for the design of a prototype system operating at a wavelength of 670 nm, for the simultaneous determination of thickness, complex permittivity and surface roughness of metal films. The apparatus was employed for characterization of gold and silver films with thicknesses within the 10-100 nm range. Thickness data measured with the prototype system were well correlated with those measured on a conventional surface profilometer. The Fourier spectrum of surface irregularities extracted from scattered light, enhanced by surface plasmon oscillations, was used to determine surface roughness parameters for the distinct samples. Those parameters were shown to be representative of typical surface structures observed with the atomic force microscope.
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