Analysis of laser-induced evaporation of Al target under conditions of vapour plasma formation

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The plasma-controlled evaporation of the Al target induced by the laser pulse with intensity of 109 W/cm2 and wavelength of 1.06 μm is analysed with account for the two-dimensional effects. The self consistent model is applied, including the heat transfer equation in condensed medium, the equations of radiation gas dynamics in evaporated substance and the Knudsen layer model at the two media boundary. It is found that the phase transition at the target surface is controlled by the two factors: the surface temperature that depends on the transmitted radiation intensity, and the plasma pressure, governed by the expansion regime. The process comes through three characteristic stages, the sonic evaporation at the beginning, the condensation during the period of plasma formation and initial expansion, and finally, the re-start of evaporation in subsonic regime after the partial brightening of the plasma. During the subsonic evaporation stage the vapour flow and the mass removal rate are much higher near the beam boundaries than in the centre due to smaller plasma counter-pressure. The vapour plasma pattern is characterised by the dense hot zone near the surface where the absorption of laser energy occurs, and rapid decrease of density outside the zone due to three-dimensional expansion.