Analysis of Hardness, Resistivity and Corrosion of HfN Thin Films Fabricated by D.C. Sputtering

Abstract

HfN is a transition metal nitride that shows interesting mechanical and chemical properties for using electronic, mechanical, corrosion, wear areas. In this work HfN thin films were fabricated by D.C. sputtering varying nitrogen flux. The Ar/N2ratio used inside in the deposition chamber was 10, 6.66, 5, 4 and 3.33. The obtained films were analyzed by X-ray diffraction, Vickers microhardness, high resistivity measurement package and tested by D.C. electrochemical techniques in order to know their crystalline structure, hardness, resistivity and corrosion resistance. We found that a straight relationship of resistivity and crystalline structure with Ar/N2flux ratio, because of decreasing that ratio resistivity increases meanwhile hardness decreased, this behavior due to amorphous phase of HfN. Electrochemical tests showed that sample at Ar/N2ratio = 5 showed the maximum polarization resistance while the sample at Ar/N2ratio = 4 showed less polarization resistance value. All results establish that HfN is a good material in corrosion and electronic areas.