Abstract
Twenty years of air sampling of 16 volatile solvents in photolithography from Intel fabs were analyzed. The 95% upper confidence limit of the 95th percentile of the samples were one-half or less than the full-shift occupational exposure limits. Each air sample was converted to a single, 15-minute exposure for comparison to the short-term exposure limits (STEL). The calculation indicated it was unlikely that the STEL values were exceeded. Inhalation exposures to the solvents have been acceptably low and well controlled for full-shift and for short-term exposure durations over many generations of processes, process equipment, and job duties.
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