Abstract
We present optimal permutation with 2.5-D power transmission lines system to reduce electro-magnetic influence at high technology nano-Fab. In this study, the magnetic field was lessened by mirror array power cable system, and simulation of results predicted the best permutations to decrease electromagnetic influence (EMI) value below 0.28 mG at working space without any shielding. Furthermore, this innovative method will cost down at high technology nano-Fab especially for 28 nanometer process.
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