Abstract
This work identifies the critical factors when developing a polymer brush vapor phase infiltration process, while also demonstrating the use of novel pyridines for area selective purposes.
Highlights
Developing vapor phase infiltration (VPI) processes for area selective polymer nanopatterning requires substantial advancement in understanding precursor infiltration, precursor–polymer interaction and process parameters
All polymers displayed the most interaction with the precursor during the initial cycles of a VPI process, with the rate of Al incorporation decreasing with an increasing number of cycles
P4VP was shown to incorporate Al at a quicker rate than P2VP during the initial VPI cycles, with the N 1s spectra analysis agreeing with literature that metal bonding and the rate of interaction with TMA is determined by the pyridinic N and its position within the ring
Summary
Developing vapor phase infiltration (VPI) processes for area selective polymer nanopatterning requires substantial advancement in understanding precursor infiltration, precursor–polymer interaction and process parameters. The functionality and versatility of this technique has led to its incorporation into fields such as microelectronics, photovoltaics and energy storage.[1,2,3,4] Recently, nanopatterning via area-selective ALD has attracted substantial interest as a route to achieving bottom-up fabrication of nanoelectronic components in the semiconductor industry.[2,5] The goal of such a process is to achieve patterned films, grown from the bottom up, rather than relying on traditional top-down architectures which are underpinned by increasingly complex and expensive optical lithography This can be achieved through several technical methods, involving the area activation and deactivation of different regions across a surface to promote or inhibit precursor interaction with the substrate, respectively. Conventional ALD-like processes have been used to study the effect of precursor interaction with polymer films,[12,13] alternative techniques with similarity to ALD have emerged, with vapor phase infiltration (VPI) being a promising technique in achieving successful, area-selective infiltration and rejection of metal precursors into certain polymer materials.[14]
Sign-in/Register to view highlights & summary Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
