Abstract

The activation methods, nuclear reactions and chemical separation processes used to determine traces of carbon, nitrogen and oxygen in the metals and semiconductors considered are described briefly. The results obtained are reviewed. They mainly concern the following analyses: (1) determination of carbon and oxygen in alkaline metals; (2) determination of nitrogen and oxygen in refractory metals; (3) determination of carbon, nitrogen and particularly oxygen in various other metals; (4) determination of these same elements in semiconducting materials. In some cases the concentrations measured by γ photon or charged particle activation methods are compared with the results obtained by other techniques.

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