Abstract
We demonstrate strong, analog, reversible, and nonvolatile memcapacitance in a Si-based MOS (metal-oxide-semiconductor) memcapacitor with an ITO (In-Sn-O)/HfOx/Si structure. Both accumulation and depletion capacitances change sequentially and reversibly upon repeating voltage application with respect to voltage polarity. This memcapacitance is thought to be induced by oxygen ions' migration between ITO and HfOx layers, which changes the HfOx permittivity and the depletion states in Si and ITO. The Si-based memcapacitor has potential to be applied to the gate stack of the MOS field-effect-transistor for nonvolatile memory and synaptic transistors through modulating drain current determined by the capacitance change of the MOS gate stack.
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