Abstract
The reduction of copper, silver, and gold surface oxides by silane (SiH4) is described. The silicon oxides generated by this process are characterized and the sensitivity of this class of reaction to such experimental parameters as substrate temperature, silane pressure, and metal oxide thickness are detailed. Oxidation of silver, as observed by X-ray photoelectron spectroscopy (XPS), is found to be complicated; the nature of the oxides generated by thermal and plasma assisted techniques is discussed.
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