Abstract

X-ray photoelectron spectroscopy (XPS) and AES have been used to study the chemistry of the native oxide film which occurs on electroplated Co–Sn (20% Co, 80% Sn) alloy and the films which form on a sputtered Co–Sn surface exposed to pure oxygen. The native oxide is similar in composition to that which forms on Sn–Ni, that is, the film is primarily stannic hydroxide (or hydrated SnO2). The films on sputtered Co–Sn exposed to pure oxygen vary in chemical composition with the exposure and are different than the native oxide. At low exposures (<10−1 Torr min) the film is primarily SnO with only a trace of cobalt oxide. At higher exposures (∠10 Torr min or higher) the film consists of SnO2 and CoO. Film thicknesses as a function of exposure have been computed from XPS intensity measurements and vary from 6.7 to 10.5 Å.

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