An X-ray Optical Method for the Determination of Diffusion Properties in Very Thin Bimetallic Films

Abstract

Abstract The change of x-ray optical properties during diffusional alloy formation can be used for the evaluation of diffusion parameters in bimetallic thin film couples. The most pronounced phenomenon governed by these properties are the known Kiessig interferences which can be observed in the specular scattered x-ray beam at very small glancing angles. From these interference patterns diffusion data can be obtained by a comparison with calculated reflection curves based on a proper model for diffusion. The most useful thickness range for this method is below 1000 Å, where common x-ray techniques lose their applicability. Since the changes in the interference patterns are most significant in the early diffusion stages, this technique is most suitable for observing initial interdiffusion, which very often occurs with enhanced diffusion rates. The experimental check of the method is performed in the Au-Ag system. Bimetallic films of the pure components were annealed at temperatures between 200 and 300 °C. In this temperature range diffusion parameters from 10-16 to 10-14 cm2/s were found in good agreement with values obtained by other techniques.