An x‐ray diffraction profile analysis in hexagonal cadmium films vacuum‐evaporated from normal and oblique vapor incidence

Abstract

Microstructural investigations on hexagonal cadmium films, considering a number of H − K=3N (namely, 00.2, 10.0, 11.0, 00.4, N1.2, and 20.0) and H − K = 3N±1 (namely, 10.1, 10.2, 10.3, 20.1, 10.4, 20.2 and 20.3) x‐ray diffraction profiles recorded in a counter diffractometer, were done by detailed Fourier analysis of lineshape and also integral breadth measurements. The films, in the thickness range of ∠200–3300 A, were vapor deposited for both normal and oblique (∠46° to the substrate normal) vapor incidences. For both the source positions Fourier lineshape analysis of the fault‐unaffected (H − K=3N) reflections indicate that the effects from the average domain size and rms strain are relatively large in the thin range ≲600 A, and these decrease at higher thickness ∠3300 A. The size and strain values along [00.2] are found to be close to the average ones depicting the near isotropy in these parameters. As regards the effective domain size values evaluated for fault‐affected (H − K=3N±1) reflections, it h...