Abstract
The adsorption site of the methoxy (CH3O) species on Al(111) has been investigated using the technique of normal incidence standing X-ray wavefield absorption. By recording the X-ray absorption of the O atom of this species at both the (111) and (111)-normal incidence Bragg scattering conditions (at normal and 70.5 degrees incidence to the surface) the adsorption site was obtained by simple real-space triangulation. The species is adsorbed in a three-fold symmetry hollow site with an O-Al layer spacing of 0.70+or-0.10 AA, (as found for chemisorbed oxygen), but the site occupied is the HCP hollow directly above an Al atom in the second layer, and not the FCC site (above an Al atom in the third layer) which is occupied by chemisorbed oxygen. This appears to be the first example of an adsorbate with a clear preference for this HCP hollow site on an otherwise clean FCC (111) surface.
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