Abstract
A chemically patterned surface was formed by controlled evaporative self-assembly of concentric polymer stripes, followed by the removal of weakly deposited polymer, giving ultrathin polymer stripes with a width gradient on the Si substrate (see picture). A thin film of diblock copolymer hierarchically self-assembled on the ultrathin polymer stripes, giving arrays of nanocylinders perpendicular to the surface of the film.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
