Abstract
The scanning tunneling microscopy is used to study morphology of a Tl adlayer in various stages of Tl desorption from the Si(111) surface. Transition from the Si(111)/(1×1)-Tl structure through the (√3×√3)R30° mosaic phase to domains of metastable Si reconstructions is observed. Silicon substitutional atoms are found to be intrinsic to the (√3×√3)R30° structure. The temperature dependence of the amount of residual Tl atoms on the surface is successfully fitted by a model using the first order desorption. The same desorption energy of (2.1±0.3) eV and frequency prefactor 5×1014±2s−1 during all stages of the desorption are sufficient for the fitting. It is concluded that bonding of Tl in both (1×1) and (√3×√3) configurations is of the same nature.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
