Abstract

It is well known that the areas of technology pursued in the former Soviet Union differ from those studied in the West. This is particularly true in surface technology, where the applications of charged particles are in a very advanced phase. In the present work, developments in three areas are reviewed: cathodic arc technology, ion implantation, and pulsed intense electron and ion beams. In the first section, a cathode design needing no insulation is described as well as an efficient method of macroparticle filtering. In the second section, ion implantation is discussed in terms of advanced gas and metal ion sources, plasma ion implantation, high penetration implantation, and the so-called “long-range effect” of hardening at depth. Finally, explosive emission and its application to pulsed intense electron and ion sources is presented together with practical applications in Russia.

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